Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition

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dc.contributor.authorVillegas, Rodrigo
dc.contributor.authorTomlinson, Matías
dc.contributor.authorUreta De La Fuente, Valentina
dc.contributor.authorCarrasco, Camilo
dc.contributor.authorMiranda, Maximiliano
dc.contributor.authorFernandez, José Ignacio
dc.contributor.authorSaavedra, Daniel
dc.contributor.authorRetamal, María José
dc.contributor.authorInestrosa-Izurieta, María José
dc.contributor.authorSingh, Dinesh Pratap
dc.contributor.authorAngel, Felipe A.
dc.contributor.authorVolkmann, Ulrich G.
dc.contributor.authorTakamura, Yayoi
dc.contributor.authorBhuyan, Heman
dc.coverage.spatialNetherlands
dc.date.accessioned2025-12-05T16:54:49Z
dc.date.available2025-12-05T16:54:49Z
dc.date.issued2025-06-20
dc.descriptionPublicación en revista científica
dc.description.abstractEfficient and cost-effective methods to create photovoltaic materials are constantly being sought, with metal oxides like TiO2 playing a key role in this field. In this study, TiO2 thin films were grown on glass substrates using a dual radiofrequency (RF) plasma-enhanced pulsed laser deposition (PLD) system with a thermal budget that remained below 400 ◦C. The physical, chemical, and optical properties of the deposited thin films were studied as a function of low- and high-RF powers as well as deposition time. These parameters were found to impact the proportion of anatase and rutile phase and their crystallinity, as well as the oxygen vacancy concentration and band gap energy. These findings demonstrated the utility of dual RF plasma-enhanced PLD for precise modulation of TiO2 thin-films, offering promising applications in photovoltaics and photocatalysis.
dc.identifier.citationApplied Surface Science 709 (2025) 163872
dc.identifier.doihttps://doi.org/10.1016/j.apsusc.2025.163872
dc.identifier.issn0169-4332
dc.identifier.orcidhttps://orcid.org/0000-0003-4225-7106
dc.identifier.urihttps://hdl.handle.net/20.500.12254/7395
dc.language.isoen
dc.publisherElservier
dc.rightsAtribución-NoComercial-CompartirIgual 3.0 Chile (CC BY-NC-SA 3.0 CL)
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/cl/
dc.subjectRadio frequency plasma
dc.subjectPulsed laser deposition
dc.subjectTitanium dioxide
dc.subjectAnatase
dc.subjectRutile
dc.titleTailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition
dc.typeArticle
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