Tailoring of titanium dioxide thin film in dual radiofrequency plasma enhanced pulsed laser deposition
Archivos
Fecha
2025-06-20
Nota de Acceso
Fecha de embargo
Profe guía
Perfil ORCID
Título de la revista
ISSN de la revista
Título del volumen
Editor
Elservier
ISBN
ISSN
0169-4332
ISSNe
Resumen
Efficient and cost-effective methods to create photovoltaic materials are constantly being sought, with metal
oxides like TiO2 playing a key role in this field. In this study, TiO2 thin films were grown on glass substrates using
a dual radiofrequency (RF) plasma-enhanced pulsed laser deposition (PLD) system with a thermal budget that
remained below 400 ◦C. The physical, chemical, and optical properties of the deposited thin films were studied as
a function of low- and high-RF powers as well as deposition time. These parameters were found to impact the
proportion of anatase and rutile phase and their crystallinity, as well as the oxygen vacancy concentration and
band gap energy. These findings demonstrated the utility of dual RF plasma-enhanced PLD for precise modulation
of TiO2 thin-films, offering promising applications in photovoltaics and photocatalysis.
Descripción
Publicación en revista científica
Lugar de Publicación
Netherlands
Sponsorship
Citación
Applied Surface Science 709 (2025) 163872
Palabras clave
Radio frequency plasma, Pulsed laser deposition, Titanium dioxide, Anatase, Rutile
Licencia
Atribución-NoComercial-CompartirIgual 3.0 Chile (CC BY-NC-SA 3.0 CL)